COVID-19 Outbreak to Decelerate Demand for Chemical Mechanical Planarization (CMP) Slurries in Short-Term, Advanced Technologies to Re-Ignite Growth through 2030, Concludes Fact.MR

CMP Slurry market is poised to witness two fold growth by the end of 2029, driven by its expanding applications in consumer electronics. Efficacy to offer exceptional planarization and minimal surface defectivity makes CMP slurries an ideal ingredient in CMP (chemical mechanical polishing).

CMP slurries will continue their legacy with the emerging need for new abrasives combined with advanced additives to maintain a steady growth trajectory. This in turn will propel the CMP slurry market to grow at an astounding CAGR of ~8% during the forecast period (2019-2029).

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Key Takeaways of CMP Slurry Market:

Technological advances in semiconductor processing and fabrication has led to the requirement for highly polished and abrasion free components which will create a progressive environment for growth of the market.

Advanced device architectures and technologies like 3D FinFETs, 3D NANDs and 3D packaging will surge the demand for CMP slurries during the assessment period.

Based on product, aluminum oxide is projected to surpass market valuation over US $ 1470 Mn by the end of 2029

Cerium oxide is projected to register dominating growth rate among other products and is anticipated to gain 147 BPS by the end of 2029

Silicon wafers are projected to remain a highly lucrative application in forthcoming years, representing over half of the global revenue share till 2029.

Advanced technologies and multilayers are set to offer additional opportunities as well as new challenges in the market.

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In terms of revenue, Asia Pacific excluding Japan (APEJ) will continue to dominate the global CMP slurry market throughout the forecast period with a CAGR of ~8%

“Increasing necessity of tunable slurries with lower defectivity and high oxide removal rate will augment the demand for CMP slurries”, says the Fact.MR analyst.

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